Students
Tuition Fee
Not Available
Start Date
Not Available
Medium of studying
Not Available
Duration
32 hours
Details
Program Details
Degree
Bachelors
Major
Electrical Engineering | Materials Science | Physics
Area of study
Engineering | Natural Science
Course Language
English
About Program

Program Overview


Program Overview

Course Introduction

The course "Thin Film Physics and Technique" is a professional elective course designed for students majoring in Physics. The course aims to provide students with a comprehensive understanding of the manufacturing technology and physical basis of thin films.


Course Details

Basic Course Information

  1. Course Name: Thin Film Physics and Technique
  2. Course Code: Not specified
  3. Credit Hours: 32 hours (theory 32 hours), 2 credits
  4. Applicable Major: Physics major (Shaofeng class)
  5. Course Nature and Attribute: Professional elective course
  6. Prerequisite Courses: "Semiconductor Physics" and "Solid State Physics"
  7. Course Management Unit: Xiangtan University, School of Physics and Optoelectronic Engineering
  8. Course Instructor: Ross Wei

Course Description

This course mainly discusses the manufacturing technology and physical basis of thin films, including the basic principles and methods of various film-forming technologies, such as evaporation, sputtering, ion plating, chemical vapor deposition, and solution preparation. It also introduces the formation, structure, and defects of thin films, as well as their electrical, mechanical, semiconductor, magnetic, and superconducting properties.


Course Objectives

  1. Master the technology, process, and thickness measurement methods of thin film preparation.
  2. Understand the high vacuum technology, vacuum evaporation, vacuum sputtering, ion plating, and chemical vapor deposition.
  3. Understand the thermodynamic interface energy theory and atomic aggregation theory to explain the thin film formation process.
  4. Understand the basic properties of thin films and lay a good foundation for their application.
  5. Cultivate students' scientific, rigorous, and practical work attitude and style.

Course Support for Graduation Requirements

  1. Students should have a correct worldview and outlook on life, good moral and humanistic qualities, and a healthy body and mind.
  2. Master the systematic and solid foundation of mathematical and physical theories and be familiar with physical experimental methods.
  3. Have the ability to analyze and solve scientific research and engineering problems in the field.
  4. Be familiar with 1-2 professional directions in the field and understand the forefront and development trends of the discipline.
  5. Master the basic methods of literature retrieval and data inquiry.

Teaching Content and Requirements

Serial Number Teaching Content Teaching Requirements Credit Hours Teaching Method Corresponding Course Objectives
1 Introduction to Vacuum Technology Master the basic knowledge of vacuum and its acquisition and measurement. 4 Lecture 2, 4, 5
2 Vacuum Evaporation Coating Master the principle of vacuum evaporation, the characteristics of evaporation sources, and the distribution of film thickness. 4 Lecture 2, 3, 4, 5
3 Sputtering Coating Understand the characteristics, basic principles, and types of sputtering coating. 4 Lecture 1, 2, 3, 4, 5
4 Ion Plating Understand the principle, characteristics, and types of ion plating. 4 Lecture 1, 2, 3, 4, 5
5 Chemical Vapor Deposition Master the basic principles, characteristics, and main CVD technologies of chemical vapor deposition. 4 Lecture 1, 2, 3, 4, 5
6 Formation of Thin Films Understand the formation process of thin films using thermodynamic interface energy and atomic aggregation theory. 4 Lecture 1, 2, 3, 4, 5
7 Structure and Defects of Thin Films Master the defects and analysis methods of thin film structure. 4 Lecture 1, 2, 3, 5
8 Properties of Thin Films Understand the electrical, mechanical, semiconductor, and other properties of thin films. 4 Lecture 1, 2, 4, 5

Recommended Textbooks and References

  1. Yang Bangchao (ed.): "Thin Film Physics and Technology", Electronic Science and Technology University Press, 1994.
  2. Tian Minbo (ed.): "Thin Film Technology and Thin Film Materials", Tsinghua University Press, 2006.
  3. Chen Guanghua, Deng Jinxian (eds.): "Nano-Thin Film Technology and Application", Chemical Industry Press, 2005.

Assessment and Evaluation

  1. Assessment Method: Examination
  2. Assessment Standards: Based on students' attendance, pre-study situation, and performance in class, as well as the content and quality of the final paper.
  3. Grade Evaluation: Class performance accounts for 50%, and the final paper accounts for 50%. Class performance is evaluated based on attendance (50%) and class participation (50%).

Teaching Schedule

Week Teaching Content Summary and Key Points Credit Hours Teaching Method Remarks
2 Introduction to vacuum technology, basic knowledge of vacuum, and methods of acquisition and measurement. 4 Lecture
3 Vacuum evaporation coating, principle of vacuum evaporation, characteristics of evaporation sources, and distribution of film thickness. 4 Lecture
4 Sputtering coating, characteristics, basic principles, and types of sputtering coating. 4 Lecture
5 Ion plating, principle, characteristics, and types of ion plating. 4 Lecture
6 Chemical vapor deposition, basic principles, characteristics, and main CVD technologies. 4 Lecture
7 Formation of thin films, thermodynamic interface energy and atomic aggregation theory. 4 Lecture
8 Structure and defects of thin films, analysis methods of thin film structure. 4 Lecture
9 Properties of thin films, electrical, mechanical, semiconductor, and other properties. 4 Lecture
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